2D Materials Laboratory

Chemical vapor Deposition for 2D TMDC growth

Graphene Square, South Korea, Model: TCVD-100B

Advanced Semi-Auto System, Water-cooled end chambers and doors

Process Temperature: ~1,100℃, Movable furnace method for fast heating

and fast cooling of the sample, Standard safety box

Planar GROW-2M Thermal Chemical Vapor Deposition (CVD) System

Planar ROW-2M thermal CVD system is a bench top horizontal quartz

hot-wall reactor for grapheme growth. Equipped with 3 Mass Flow

Controller (MFC) controlled gas lines [CH4, Ar, and H2] along

with 10 Torr Capacitance Manometer and Mass Flow and Pressure Controller. Maximum temperature of the reactor is 1100°C.